Major equipment in our lab:
- Fluorescence microscope with wide-field illumination (Olympus IX71, multi-color laser excitation, em-CCD detection)
- Patch-clamp systems for ion-current measurements through nanoporous membranes (Axopatch 200B’s, temperature-controlled measurement cells)
- Fast-scanning AFM system (Bruker FastScan and Dimension Icon modules)
- Reactive ion etch system with fluorine and oxygen chemistry (Technics micro-RIE 800)
- Atomic-layer deposition system for conformal thin-film deposition (Arradiance Gemstar)
- UV-vis spectrophotometer with multi-cell temperature control (Varian Cary 100)
- Ellipsometer (Rudolph Research AutoEL III)
- Dynamic and static contact angle meter (home built)
- Mask aligner and full photolithography unit (home built)
On-campus facilities that we use:
- JEOL 2010F transmission electron microscope with ultrascan 2k x 2k CCD (due soon…)
- Electron beam lithography system (Zeiss Supra 25 with NABITY system)
- Kostas facility for micro/nano-fabrication (photolithography, thermal oxidation, metal deposition)